Idaho Surplus Equipment
The list below contains the current inventory of semiconductor equipment being offered for sale. This equipment is owned by Micron and is located at our Boise facility.
Please be sure to read our Terms and Conditions and review our 
Letter of Agreement.
If you are interested in any of the equipment listed, and wish to submit an offer, or require additional details, please contact us. A Micron representative can discuss specific configurations, terms and conditions or other aspects concerning items listed
For additional details, call Tel: 208-368-3750 Fax: 208-368-4430 or contact us via email.
This list was last updated on 02/05/2009.
| FABRICATION EQUIPMENT |
| Description |
Model # |
Manufacturer |
Qty |
| PVD SYSTEM |
ENTRON |
ULVAC |
1 |
| WAFER INSPECTION |
2138XP |
KLA TENCOR |
2 |
| CVD SYSTEM, 4CH WxZ |
CENTURA |
APPLIED MATERIALS |
1 |
| PATTERNED WAFER INSPECTION |
7700 |
KLA TENCOR |
2 |
| PHOTO TRACK |
SK-200W |
DNS |
4 |
| CVD SYSTEM, TRIPLE SPEED-S, 200MM |
CONCEPT 2 |
NOVELLUS |
4 |
| SCANNER |
PAS 5500/750E |
ASML |
1 |
| SCANNER |
PAS 5500/700C |
ASML |
1 |
| IMPLANTER, HIGH CURRENT |
ULTRA |
AXCELIS |
1 |
| WAFER INSPECTION |
6220 |
KLA-TENCOR |
1 |
| SCANNER |
PAS 5500/800 |
ASML |
1 |
| PHOTO TRACK |
ACT 8 |
TEL |
1 |
| FURNACE, VERTICLE |
ALPHA 8SE |
TEL |
1 |
| ETCHER, 3 CH POLY |
P5000 |
APPLIED MATERIALS |
1 |
| ETCHER, 3 CH OXIDE |
P5000 |
APPLIED MATERIALS |
1 |
| STEPPER |
PAS 5500/200B |
ASML |
1 |
| MASK INSPECTION |
NANOSEM 3D |
APPLIED MATERIALS |
1 |
| RETICLE REVIEW & REPAIR |
nm1300 |
RAVE |
1 |
| CRYOGENIC MASK CLEANING MODULE |
SCS100 |
RAVE |
1 |
| RETICLE INSPECTION |
SLF27 |
KLA-TENCOR |
1 |
| TEST EQUIPMENT |
| TESTER |
5593 |
ADVANTEST |
1 |
| HANDLER, PARTS |
M6751A |
ADVANTEST |
2 |
| HANDLER, PARTS |
M6741A |
ADVANTEST |
1 |
| OTHER EQUIPMENT |
| SEM |
SEMVISION |
APPLIED MATERIALS |
2 |
| WHAT'S NEW |
| FURNACE, VERTICLE |
ZESTONE III |
KOKUSAI |
4 |
| CMP SYSTEM |
MIRRA |
APPLIED MATERIALS |
6 |
| INSPECTION SYSTEM |
LEXFAB 300 |
CAMECA |
1 |
| PVD SYSTEM |
ENDURA |
APPLIED MATERIALS |
4 |
| CMP SCRUBBER |
AS2000 |
DNS |
5 |
| INSPECTION SYSTEM |
STEALTH |
KLA-TENCOR |
1 |
| PHOTO TRACK |
SK2000 |
DNS |
2 |
| CVD SYSTEM, 3 TWIN CHAMBER |
PRODUCER S |
APPLIED MATERIALS |
5 |
| CVD SYSTEM |
UNITY EP |
TEL |
2 |
| CVD SYSTEM, TUNGSTEN |
PAS 5500/200B |
ASML |
1 |
| MASK INSPECTION |
ALTUS |
NOVELLUS |
3 |
| RTP SYSTEM |
SUMMIT 200 |
AXCELIS |
4 |
| VERTICLE FURNACE |
A400/2 |
ASM |
10 |
| ETCH SYSTEM, DPS METAL |
5200 |
APPLIED MATERIALS |
3 |
| ETCH SYSTEM, POLY, 4 CH |
ALLIANCE 9400 |
LAM RESEARCH |
4 |
| ETCH SYSTEM, 3 CH |
UNITY M 85TD |
TEL |
4 |
| INSPECTION SYSTEM |
VERASEM 3D |
APPLIED MATERIALS |
3 |
| REGISTRATION SYSTEM |
ARCHER 10 |
KLA-TENCOR |
2 |
| INSPECTION SYSTEM |
AIT XP+ |
KLA-TENCOR |
3 |
| SURFACE ANALYSIS |
SP-1 |
KLA-TENCOR |
3 |
| SEM |
SUPERVISION G2 |
APPLIED MATERIALS |
2 |
| INSPECTION SYSTEM |
SP-2 |
APPLIED MATERIALS |
1 |
| OVEN, POLY CURE |
2020B |
GENESIS |
2 |
| WET BENCH |
UW-200Z |
TEL |
3 |
| SCRUBBER, 6 HEAD |
SS-W80B-AR |
DNS |
6 |
| ASHER |
GEMINI |
AXCELIS |
10 |
| BOX WASHER |
HTC8020 |
ENTEGRIS |
1 |
| BOX WASHER |
HTC8030 |
ENTEGRIS |
1 |
| OVEN, POLY CURE |
2020B |
GENESIS |
2 |
| IMPLANTER, HIGH CURRENT |
V80 |
VARIAN |
4 |
| IMPLANTER, HIGH ENERGY |
1525 |
GENUS/VARIAN |
2 |
| INSPECTION SYSTEM |
UV1250SE |
KLA-TENCOR |
1 |
| INSPECTION SYSTEM |
UV1050 |
KLA-TENCOR |
5 |
| OVEN |
LLC1-51N-3 |
DESPATCH |
2 |
| MEASUREMENT SYSTEM |
9010T |
NANOMETRICS |
1 |
| WAFER CLEANER |
SU3000 |
DNS |
1 |
| CD & FILM MEASUREMENT SYSTEM |
3090CD |
NOVA MEASURING |
2 |
| SEM |
6700F |
JEOL |
1 |
| SEM |
6340F |
JEOL |
1 |
| SCREEN PRINTER |
UP3000UF |
MPM |
1 |
| INSPECTION SYSTEM |
S8300 |
GSI |
1 |
| CVD SYSTEM |
INOVA XT |
NOVELLUS |
1 |
| CVD SYSTEM |
LEVITOR 4300 |
ASM |
1 |
| ASHER |
ES3 |
AXCELIS |
1 |